Structural and tribological properties of TiWAlSiCuN films annealed at different temperatures

Öz

This work focuses on evaluating the influence of post-deposition annealing temperature on the structural characteristics and tribological behavior of TiWAlSiCuN films. The films were produced on AISI M2 tool steel substrates using RF magnetron sputtering and then heat-treated at 600, 700, 800, and 900 °C for 90 min in a controlled atmosphere. Structural phase evolution was investigated by X-ray diffraction, whereas elemental distribution was characterized through scanning electron microscopy coupled with energy-dispersive spectroscopy. Furthermore, hardness, surface roughness, coefficient of friction, and wear rate measurements were carried out to assess the performance of the films after annealing. The experimental results demonstrated that annealing temperature played a critical role in determining both the microstructural and tribological properties of the films. Among all films examined, the film treated at 800 °C showed the most favorable performance, achieving a hardness of 24.5±0.9 GPa, a friction coefficient of 0.37, a surface roughness of 0.07 µm, and a wear rate of 1.97×10-6 mm3/(N·m). The superior performance obtained at 800 °C was attributed to the enhanced microstructural stability of the TiN-containing film structure, which preserved film integrity during sliding and limited tribo-oxidative damage.

Anahtar Kelimeler

• TiWAlSiCuN film
• annealing temperature
• hardness
• tribological properties

Farklı sıcaklıklarda tavlanmış TiWAlSiCuN filmlerinin yapısal ve tribolojik özellikleri

Öz

Bu çalışma, TiWAlSiCuN filmlerinin yapısal özellikleri ve tribolojik davranışları üzerindeki biriktirme sonrası tavlama sıcaklığının etkisini değerlendirmeye odaklanmaktadır. Filmler, AISI M2 takım çeliği alt tabakalar üzerine RF manyetik püskürtme yöntemi kullanılarak üretilmiş ve daha sonra kontrollü bir atmosferde 90 dakika boyunca 600, 700, 800 ve 900 °C'de ısıl işleme tabi tutulmuştur. Yapısal faz evrimi X-ışını kırınımı ile incelenirken, elementel dağılım enerji dağılımlı spektroskopi ile birleştirilmiş taramalı elektron mikroskobu ile karakterize edilmiştir. Ayrıca, tavlama sonrası filmlerin performansını değerlendirmek için sertlik, yüzey pürüzlülüğü, sürtünme katsayısı ve aşınma oranı ölçümleri yapılmıştır. Deneysel sonuçlar, tavlama sıcaklığının filmlerin hem mikroyapısal hem de tribolojik özelliklerinin belirlenmesinde kritik bir rol oynadığını göstermiştir. İncelenen tüm filmler arasında, 800 °C'de işlem gören film en uygun performansı göstererek 24.5±0.9 GPa sertlik, 0.37 sürtünme katsayısı, 0.07 µm yüzey pürüzlülüğü ve 1.97×10-6 mm³/(N·m) aşınma oranı elde etti. 800 °C'de elde edilen üstün performans, kayma sırasında film bütünlüğünü koruyan ve tribo-oksidatif hasarı sınırlayan TiN içeren film yapısının gelişmiş mikroyapısal stabilitesine atfedilmiştir.

Anahtar Kelimeler

• TiWAlSiCuN film
• tavlama sıcaklığı
• sertlik
• tribolojik özellikler

Kaynakça

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